Invention Grant
- Patent Title: Optical sample characterization system
- Patent Title (中): 光学样品表征系统
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Application No.: US11291246Application Date: 2005-11-30
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Publication No.: US07440094B2Publication Date: 2008-10-21
- Inventor: Woo Sik Yoo
- Applicant: Woo Sik Yoo
- Applicant Address: US CA San Jose
- Assignee: Wafermasters Incorporated
- Current Assignee: Wafermasters Incorporated
- Current Assignee Address: US CA San Jose
- Agency: MacPherson Kwok Chen & Heid, LLP.
- Agent Tom Chen
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
Systems and techniques for characterizing samples using optical techniques. Coherent light may be incident on a sample, and a diffraction pattern detected. Information indicative of diffraction pattern intensity may be used to determine one or more sample characteristics and/or one or more pattern characteristics. For example, sample characteristics such as stress, warpage, curvature, and contamination may be determined. The coherent light may be light of a single wavelength, or may be light of multiple wavelengths.
Public/Granted literature
- US20070121105A1 Optical sample characterization system Public/Granted day:2007-05-31
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