Invention Grant
US07446544B2 Probe apparatus, wafer inspecting apparatus provided with the probe apparatus and wafer inspecting method
有权
探针装置,设置有探针装置的晶片检查装置和晶片检查方法
- Patent Title: Probe apparatus, wafer inspecting apparatus provided with the probe apparatus and wafer inspecting method
- Patent Title (中): 探针装置,设置有探针装置的晶片检查装置和晶片检查方法
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Application No.: US10593830Application Date: 2005-03-30
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Publication No.: US07446544B2Publication Date: 2008-11-04
- Inventor: Hisao Igarashi , Katsumi Sato , Kazuo Inoue
- Applicant: Hisao Igarashi , Katsumi Sato , Kazuo Inoue
- Applicant Address: JP Tokyo
- Assignee: JSR Corporation
- Current Assignee: JSR Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- Priority: JP2004-102948 20040331
- International Application: PCT/JP2005/006108 WO 20050330
- International Announcement: WO2005/096368 WO 20051013
- Main IPC: G01R31/02
- IPC: G01R31/02

Abstract:
A probe device including a circuit board for inspection having a great number of inspection electrodes, a probe card having a circuit board for connection having a great number of terminal electrodes and a contact member, an anisotropically conductive connector arranged between the circuit board for inspection and the circuit board for connection and electrically connecting the respective inspection electrodes to the respective terminal electrodes, and a parallelism adjusting mechanism for adjusting a parallelism of the circuit board for inspection and the circuit board for connection to the wafer. The parallelism adjusting mechanism includes a location-varying mechanism, which relatively displaces the circuit board for inspection or the circuit board for connection in the thickness-wise direction of the anisotropically conductive connector. A wafer inspection apparatus can include the probe device.
Public/Granted literature
- US20070178727A1 Probe apparatus,wafer inspecting apparatus provided with the probe apparatus and wafer inspecting method Public/Granted day:2007-08-02
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