Invention Grant
- Patent Title: Protection layers in micromirror array devices
- Patent Title (中): 微镜阵列器件中的保护层
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Application No.: US11135699Application Date: 2005-05-24
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Publication No.: US07459402B2Publication Date: 2008-12-02
- Inventor: Jonathan Doan , Satyadev Patel , Peter Heureux
- Applicant: Jonathan Doan , Satyadev Patel , Peter Heureux
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent Wade J. Brady, III; Frederick J. Telecky, Jr.
- Main IPC: H01L21/302
- IPC: H01L21/302
Abstract:
To protect the structural layers from being eroded in the etching process, a protection layer is deposited on the exposed structural layers of the micromirror. The protection layer is deposited before etching and removed after etching.
Public/Granted literature
- US20050206993A1 Protection layers in micromirror array devices Public/Granted day:2005-09-22
Information query
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