Invention Grant
US07479403B2 Pinned photodiode integrated with trench isolation and fabrication method
有权
固定光电二极管集成沟槽隔离和制造方法
- Patent Title: Pinned photodiode integrated with trench isolation and fabrication method
- Patent Title (中): 固定光电二极管集成沟槽隔离和制造方法
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Application No.: US11488611Application Date: 2006-07-19
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Publication No.: US07479403B2Publication Date: 2009-01-20
- Inventor: Dun-Nian Yaung , Sou-Kuo Wu , Ho-Ching Chien , Chien-Hsien Tseng , Jeng-Shyan Lin
- Applicant: Dun-Nian Yaung , Sou-Kuo Wu , Ho-Ching Chien , Chien-Hsien Tseng , Jeng-Shyan Lin
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A photo sensor with pinned photodiode structure integrated with a trench isolation structure. The photo sensor includes a substrate of a first conductivity type, at least one trench in the substrate, at least one doped region of the first conductivity type, and at least one doped region of a second conductivity type. Each doped region of the first conductivity type is beneath a corresponding trench. Each doped region of the second conductivity type is sandwiched between the corresponding doped region and the substrate of the first conductivity type. No edge of any doped region of the first or second conductivity type extends to the trench corners. A method of fabricating the photo sensor is also provided.
Public/Granted literature
- US20060270091A1 Pinned photodiode integrated with trench isolation and fabrication method Public/Granted day:2006-11-30
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