Invention Grant
- Patent Title: Method and apparatus for colloidal particle cleaning
- Patent Title (中): 胶体颗粒清洗方法和装置
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Application No.: US11414146Application Date: 2006-04-28
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Publication No.: US07497913B2Publication Date: 2009-03-03
- Inventor: Abbas Rastegar , Sean Eichenlaub
- Applicant: Abbas Rastegar , Sean Eichenlaub
- Applicant Address: US TX Austin
- Assignee: Sematech Inc.
- Current Assignee: Sematech Inc.
- Current Assignee Address: US TX Austin
- Agency: Fulbright & Jaworski LLP
- Main IPC: B08B7/00
- IPC: B08B7/00 ; B08B7/04 ; B08B3/00 ; B08B3/04

Abstract:
Methods and apparatuses for cleaning a surface is provided. In one embodiment, a method includes the step of determining the type and size of the contaminant particles. A solution, which may include a plurality of variable size particles, may be selected such that an appropriate size cleaning particle is used during the cleaning process. The solution may include polystyrene latex particles or other cleaning particles. Alternatively, the solution may be a slurry. The solution and particles are delivered to the surface via a nozzle at a velocity that does not damage the surface and that clears the contaminants from the surface.
Public/Granted literature
- US20060260662A1 Method and apparatus for colloidal particle cleaning Public/Granted day:2006-11-23
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