Invention Grant
- Patent Title: Electron beam system and method of operating the same
- Patent Title (中): 电子束系统及其操作方法
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Application No.: US11873639Application Date: 2007-10-17
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Publication No.: US07569819B2Publication Date: 2009-08-04
- Inventor: Norihisa Mori
- Applicant: Norihisa Mori
- Applicant Address: JP Tokyo
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP2006-282212 20061017; JP2007-138679 20070525
- Main IPC: H01J37/26
- IPC: H01J37/26

Abstract:
An electron beam system (such as a scanning electron microscope or an electron probe microanalyzer) capable of displaying backscattered electron (BSE) images at the same brightness and same contrast at all times if the atomic number differences are the same when illumination conditions including accelerating voltage and emission current are varied or when the specimens are imaged with different instruments.
Public/Granted literature
- US20080087821A1 Electron Beam System and Method of Operating the Same Public/Granted day:2008-04-17
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