Invention Grant
- Patent Title: Thin silicon based substrate
- Patent Title (中): 薄硅基底材
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Application No.: US12221997Application Date: 2008-08-08
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Publication No.: US07589424B2Publication Date: 2009-09-15
- Inventor: Sriram Muthukumar , Devendra Natekar
- Applicant: Sriram Muthukumar , Devendra Natekar
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: H01L29/00
- IPC: H01L29/00

Abstract:
Embodiments of the invention provide a device with a die and a substrate having a similar coefficient of thermal expansion to that of the die. The substrate may comprise a silicon base layer. Build up layers may be formed on the side of the base layer further from the die.
Public/Granted literature
- US20080303159A1 Thin Silicon based substrate Public/Granted day:2008-12-11
Information query
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