Invention Grant
- Patent Title: Charged-particle beam system
- Patent Title (中): 带电粒子束系统
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Application No.: US11585049Application Date: 2006-10-23
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Publication No.: US07605378B2Publication Date: 2009-10-20
- Inventor: Kazuhiro Honda , Shinobu Uno
- Applicant: Kazuhiro Honda , Shinobu Uno
- Applicant Address: JP Tokyo
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP2005-317896 20051101
- Main IPC: G21K1/08
- IPC: G21K1/08

Abstract:
There is disclosed a charged-particle beam system equipped with a higher-order aberration corrector capable of correcting fifth-order spherical aberration and third-order chromatic aberration such that the primary trajectory of an electron beam is not affected by the strength of a transfer lens. The corrector is so adjusted that the image point of the corrector is located at a position shifted a distance of L0 from the principal plane of an objective lens toward the electron source. The transfer lens is so disposed that the position of the principal plane is coincident with the image point of the corrector. Therefore, the primary trajectory of the electron beam passes through the center of the transfer lens. Consequently, the primary trajectory is not affected by the strength of the transfer lens.
Public/Granted literature
- US20070114408A1 Charged-particle beam system Public/Granted day:2007-05-24
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