Invention Grant
US07608998B2 Vacuum device having non-evaporable getter component with increased exposed surface area
有权
具有不可蒸发的吸气剂组分的真空装置具有增加的暴露表面积
- Patent Title: Vacuum device having non-evaporable getter component with increased exposed surface area
- Patent Title (中): 具有不可蒸发的吸气剂组分的真空装置具有增加的暴露表面积
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Application No.: US11387222Application Date: 2006-03-22
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Publication No.: US07608998B2Publication Date: 2009-10-27
- Inventor: Sriram Ramamoorthi , Zhizhang Chen , John Liebeskind , Ronald L. Enck , Jennifer Shih
- Applicant: Sriram Ramamoorthi , Zhizhang Chen , John Liebeskind , Ronald L. Enck , Jennifer Shih
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: H01J17/24
- IPC: H01J17/24 ; H01J19/70 ; H01J61/26
Abstract:
A vacuum device, including a substrate and a support structure having a support perimeter, where the support structure is disposed over the substrate. In addition, the vacuum device also includes a non-evaporable getter layer having an exposed surface area. The non-evaporable getter layer is disposed over the support structure, and extends beyond the support perimeter, in at least one direction, of the support structure forming a vacuum gap between the substrate and the non-evaporable getter layer increasing the exposed surface area.
Public/Granted literature
- US20060164009A1 Vacuum device having a getter Public/Granted day:2006-07-27
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