Invention Grant
US07640887B2 Surface wave excitation plasma generator and surface wave excitation plasma processing apparatus 失效
表面波激发等离子体发生器和表面波激发等离子体处理装置

  • Patent Title: Surface wave excitation plasma generator and surface wave excitation plasma processing apparatus
  • Patent Title (中): 表面波激发等离子体发生器和表面波激发等离子体处理装置
  • Application No.: US11815755
    Application Date: 2006-04-20
  • Publication No.: US07640887B2
    Publication Date: 2010-01-05
  • Inventor: Masayasu Suzuki
  • Applicant: Masayasu Suzuki
  • Applicant Address: JP Kyoto
  • Assignee: Shimadzu Corporation
  • Current Assignee: Shimadzu Corporation
  • Current Assignee Address: JP Kyoto
  • Agent J. C. Patents
  • Priority: JP2005-128079 20050426
  • International Application: PCT/JP2006/308329 WO 20060420
  • International Announcement: WO2006/118042 WO 20061109
  • Main IPC: C23C16/00
  • IPC: C23C16/00
Surface wave excitation plasma generator and surface wave excitation plasma processing apparatus
Abstract:
The present invention provides a surface wave excitation plasma generator in which surface wave excitation plasma is efficiently generated. A surface wave excitation plasma generator including an annular waveguide and a dielectric tube is provided. The annular waveguide 2 includes an inlet 2a for introducing a microwave M, an end plate 2b for reflecting the microwave M introduced and propagating within the waveguide, and a bottom plate 2c on which slot antennas 2d are formed at a predetermined interval. When the wavelength of the microwave M in the waveguide is λg, the length from position b through positions c, d, e to position f on the bottom plate 2c, i.e. the circumferential length (π×D1) of the annular waveguide, is set as 2 λg, and the positions b, c, d, e, f are spaced apart at an interval of λg/2. Since the slot antennas 2d are arranged at two positions c and e, the interval between these two slot antennas 2d is equal to the wavelength λg in the waveguide.
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