Invention Grant
- Patent Title: Method of manufacturing liquid ejection head and image forming apparatus
- Patent Title (中): 液体喷射头和成像设备的制造方法
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Application No.: US11902332Application Date: 2007-09-20
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Publication No.: US07641321B2Publication Date: 2010-01-05
- Inventor: Shuji Takahashi
- Applicant: Shuji Takahashi
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2006-257800 20060922
- Main IPC: B41J2/045
- IPC: B41J2/045 ; H01L41/22 ; H04R17/00

Abstract:
The method of manufacturing a liquid ejection head includes the steps of: forming a groove section in a first layer of a substrate including at least the first layer and a second layer, the groove section having a bottom face constituted by the second layer and being formed in a ring shape; forming a protective film on the groove section; forming a diaphragm on a surface of the first layer where the groove section is opened; forming a piezoelectric element on the diaphragm; forming an opening section in the diaphragm so as to expose a portion of a region of the first layer surrounded by the groove section; and etching the first layer via the opening section so as to form a pressure chamber, using the second layer as an etching stop layer.
Public/Granted literature
- US20080074472A1 Method of manufacturing liquid ejection head and image forming apparatus Public/Granted day:2008-03-27
Information query
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