Invention Grant
- Patent Title: Dual substrate loadlock process equipment
- Patent Title (中): 双基板负载锁定工艺设备
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Application No.: US10842079Application Date: 2004-05-10
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Publication No.: US07641434B2Publication Date: 2010-01-05
- Inventor: Shinichi Kurita , Wendell T. Blonigan , Akihiro Hosokawa
- Applicant: Shinichi Kurita , Wendell T. Blonigan , Akihiro Hosokawa
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/00

Abstract:
One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. The loadlock includes an elevator to control the vertical position of the support structures. The loadlock also includes a first aperture to permit insertion of an unprocessed substrate into the loadlock and removal of a processed substrate from the loadlock, as well as a second aperture to permit removal of an unprocessed substrate from the loadlock and insertion of a processed substrate into the loadlock. A cooling plate is also located in the loadlock. The cooling plate includes a surface adapted to support a processed substrate thereon. A heating device may be located in the loadlock above the first support structure.
Public/Granted literature
- US20050016454A1 Dual substrate loadlock process equipment Public/Granted day:2005-01-27
Information query
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