Invention Grant
- Patent Title: Flow passage structure for refrigerant compressor
- Patent Title (中): 制冷剂压缩机流道结构
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Application No.: US11507009Application Date: 2006-08-21
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Publication No.: US07641439B2Publication Date: 2010-01-05
- Inventor: Jiing Fu Chen , Chung-Ping Chiang , Yung-Lo Chow , Cheng-Chung Yen
- Applicant: Jiing Fu Chen , Chung-Ping Chiang , Yung-Lo Chow , Cheng-Chung Yen
- Applicant Address: TW Hsinchu Hsien
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu Hsien
- Agency: Rabin & Berdo, P.C.
- Priority: TW94144407A 20051215
- Main IPC: F04D17/12
- IPC: F04D17/12 ; F25B31/00

Abstract:
A flow passage structure can be disposed in a multi-stage centrifugal refrigerant compressor having a deswirl vane and a return channel bend. The flow passage structure includes a two-way flow passage having a first outlet and a second outlet, for diverging externally injected refrigerant; a first side discharge flow passage connected to the first outlet of the two-way flow passage and having a first side outlet disposed below the deswirl vane, such that the diverged refrigerant can be discharged into the return channel bend and uniformly mixed with the refrigerant in the return channel bend; and a second side discharge flow passage connected to the second outlet of the two-way flow passage and having a second side outlet disposed below the deswirl, vane, such that the diverged refrigerant can be injected into the return channel bend and uniformly mixed with the refrigerant in the return channel bend.
Public/Granted literature
- US20070140889A1 Flow passage structure for refrigerant compressor Public/Granted day:2007-06-21
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