Invention Grant
US07641761B2 Apparatus and method for forming thin film using surface-treated shower plate
有权
使用表面处理淋浴板形成薄膜的设备和方法
- Patent Title: Apparatus and method for forming thin film using surface-treated shower plate
- Patent Title (中): 使用表面处理淋浴板形成薄膜的设备和方法
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Application No.: US11038888Application Date: 2005-01-20
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Publication No.: US07641761B2Publication Date: 2010-01-05
- Inventor: Naoto Tsuji , Yukihiro Mori , Tominori Yoshida , Masami Suzuki
- Applicant: Naoto Tsuji , Yukihiro Mori , Tominori Yoshida , Masami Suzuki
- Applicant Address: JP Tokyo
- Assignee: ASM Japan K.K.
- Current Assignee: ASM Japan K.K.
- Current Assignee Address: JP Tokyo
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2004-012826 20040121
- Main IPC: C23F1/00
- IPC: C23F1/00 ; H01L21/306 ; C23C16/00
Abstract:
A plasma CVD apparatus includes a showerhead comprised of a body having a hollow structure. The shower plate is detachably integrated with the body at a peripheral surface of the body and a peripheral surface of the shower plate, and at least one of the peripheral surface of the body or the peripheral surface of the shower plate is surface-treated.
Public/Granted literature
- US20050156063A1 Apparatus and method for forming thin film using surface-treated shower plate Public/Granted day:2005-07-21
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