Invention Grant
US07642038B2 Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus 有权
形成图案的方法,薄膜晶体管,显示装置,其制造方法和电视装置

Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
Abstract:
To provide a display device which can be manufactured with higher efficiency in the use of material through a simplified manufacturing process, and a method for manufacturing the display device. Another object is to provide a technique by which patterns of a wiring the like which constitutes the display device can be formed to a desired shape with good control. In a method for forming a pattern according to the present invention, a mask is formed over a light-transmitting substrate; a first region including a photocatalyst is formed over the substrate and the mask; the photocatalyst is irradiated with light through the substrate to modify a part of the first region; a second region is formed; and a composition containing a pattern forming material is discharged to the second region, thus, a pattern is formed. The mask does not transmit light.
Information query
Patent Agency Ranking
0/0