Invention Grant
- Patent Title: Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
- Patent Title (中): 形成图案的方法,薄膜晶体管,显示装置,其制造方法和电视装置
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Application No.: US11085274Application Date: 2005-03-22
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Publication No.: US07642038B2Publication Date: 2010-01-05
- Inventor: Gen Fujii
- Applicant: Gen Fujii
- Applicant Address: JP Atsugi-shi, Kanagawa-Ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-Ken
- Agency: Nixon Peabody, LLP
- Agent Jeffrey L. Costellia
- Priority: JP2004-088068 20040324
- Main IPC: H01L21/00
- IPC: H01L21/00 ; G03F9/00

Abstract:
To provide a display device which can be manufactured with higher efficiency in the use of material through a simplified manufacturing process, and a method for manufacturing the display device. Another object is to provide a technique by which patterns of a wiring the like which constitutes the display device can be formed to a desired shape with good control. In a method for forming a pattern according to the present invention, a mask is formed over a light-transmitting substrate; a first region including a photocatalyst is formed over the substrate and the mask; the photocatalyst is irradiated with light through the substrate to modify a part of the first region; a second region is formed; and a composition containing a pattern forming material is discharged to the second region, thus, a pattern is formed. The mask does not transmit light.
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