Invention Grant
US07642042B2 Polymer, top coating layer, top coating composition and immersion lithography process using the same
有权
聚合物，顶涂层，顶涂层组合物和使用其的浸渍光刻工艺
- Patent Title: Polymer, top coating layer, top coating composition and immersion lithography process using the same
- Patent Title (中): 聚合物，顶涂层，顶涂层组合物和使用其的浸渍光刻工艺
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Application No.: US11585082Application Date: 2006-10-24
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Publication No.: US07642042B2Publication Date: 2010-01-05
- Inventor: Mitsuhiro Hata , Sang-Jun Choi , Sang-Gyun Woo , Man-Hyoung Ryoo
- Applicant: Mitsuhiro Hata , Sang-Jun Choi , Sang-Gyun Woo , Man-Hyoung Ryoo
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2005-0100412 20051024
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/30
Abstract:
A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are disclosed. The top coating layer polymer may include a deuterated carboxyl group having a desired acidity such that the top coating layer polymer may be insoluble with water and a photoresist, and soluble in a developer. The polymer may be included in a top coating layer and a top coating composition.
Public/Granted literature
- US20070155925A1 Polymer, top coating layer, top coating composition and immersion lithography process using the same Public/Granted day:2007-07-05
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