Semiconductor device having in-chip critical dimension and focus patterns

Invention Grant

US07642101B2 Semiconductor device having in-chip critical dimension and focus patterns 失效

Title translation: 具有芯片临界尺寸和聚焦图案的半导体器件

Patent Title: Semiconductor device having in-chip critical dimension and focus patterns
Patent Title (中): 具有芯片临界尺寸和聚焦图案的半导体器件
Application No.: US11567055

Application Date: 2006-12-05
Publication No.: US07642101B2

Publication Date: 2010-01-05
Inventor: George Liu , Vencent Chang , Chin-Hsiang Lin , Kuei Shun Chen , Norman Chen
Applicant: George Liu , Vencent Chang , Chin-Hsiang Lin , Kuei Shun Chen , Norman Chen
Applicant Address: TW Hsin-Chu
Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
Current Assignee Address: TW Hsin-Chu
Agency: Haynes and Boone, LLP
Main IPC: H01L21/66
IPC: H01L21/66 ; G01R31/26

Abstract:

A semiconductor device is fabricated to include one or more sets of calibration patterns used to measure line pitch and line focus.

Abstract(Chinese):

制造半导体器件以包括用于测量线间距和线焦点的一组或多组校准图案。

Public/Granted literature

Information query

Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/66	.在制造或处理过程中的测试或测量