Invention Grant
- Patent Title: Method for manufacturing image sensor
- Patent Title (中): 图像传感器制造方法
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Application No.: US12250008Application Date: 2008-10-13
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Publication No.: US07642119B2Publication Date: 2010-01-05
- Inventor: Chung Kyung Jung
- Applicant: Chung Kyung Jung
- Applicant Address: KR Seoul
- Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Saliwanchik, Lloyd & Saliwanchik
- Priority: KR10-2007-0112156 20071105
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for manufacturing an image sensor is provided. The method can include forming an oxide layer on a color filter layer, forming a first oxide layer microlens by etching the oxide layer, forming a second oxide layer microlens on the first oxide layer microlens, and forming a third oxide layer microlens on the second oxide layer microlens.
Public/Granted literature
- US20090117682A1 Method for Manufacturing Image Sensor Public/Granted day:2009-05-07
Information query
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