Invention Grant
- Patent Title: Thermally insulated phase change memory manufacturing method
- Patent Title (中): 绝热相变存储器制造方法
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Application No.: US12173299Application Date: 2008-07-15
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Publication No.: US07642123B2Publication Date: 2010-01-05
- Inventor: Hsiang-Lan Lung
- Applicant: Hsiang-Lan Lung
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Agent James F. Hann
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A thermally insulated memory device includes a memory cell, the memory cell having electrodes with a via extending therebetween, a thermal insulator within the via and defining a void extending between the electrode surfaces. A memory material, such as a phase change material, is within the void and electrically couples the electrodes to create a memory material element. The thermal insulator helps to reduce the power required to operate the memory material element. An electrode may contact the outer surface of a plug to accommodate any imperfections, such as the void-type imperfections, at the plug surface. Methods for making the device and accommodating plug surface imperfections are also disclosed.
Public/Granted literature
- US20080268565A1 THERMALLY INSULATED PHASE CHANGE MEMORY MANUFACTURING METHOD Public/Granted day:2008-10-30
Information query
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