Invention Grant
US07642160B2 Method of forming a flash NAND memory cell array with charge storage elements positioned in trenches 有权
形成具有位于沟槽中的电荷存储元件的闪存NAND存储单元阵列的方法

  • Patent Title: Method of forming a flash NAND memory cell array with charge storage elements positioned in trenches
  • Patent Title (中): 形成具有位于沟槽中的电荷存储元件的闪存NAND存储单元阵列的方法
  • Application No.: US11614894
    Application Date: 2006-12-21
  • Publication No.: US07642160B2
    Publication Date: 2010-01-05
  • Inventor: Nima Mokhlesi
  • Applicant: Nima Mokhlesi
  • Applicant Address: US CA Milpitas
  • Assignee: SanDisk Corporation
  • Current Assignee: SanDisk Corporation
  • Current Assignee Address: US CA Milpitas
  • Agency: Davis Wright Tremaine LLP
  • Main IPC: H01L21/8247
  • IPC: H01L21/8247
Method of forming a flash NAND memory cell array with charge storage elements positioned in trenches
Abstract:
NAND arrays of memory cells are described, as well as methods of forming and using them. Memory cell charge storage devices, such as conductive floating gates, are oriented vertically in trenches, with control gates positioned both in the trenches between charge storage elements and over a horizontal surface between the trenches. Individual charge storage devices are therefore field coupled with two control gates, one on either side.
Information query
Patent Agency Ranking
0/0