Invention Grant
- Patent Title: Laser crystallization apparatus and crystallization method
- Patent Title (中): 激光结晶装置及结晶方法
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Application No.: US11608947Application Date: 2006-12-11
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Publication No.: US07642482B2Publication Date: 2010-01-05
- Inventor: Yoshio Takami , Tatsuhiro Taguchi
- Applicant: Yoshio Takami , Tatsuhiro Taguchi
- Applicant Address: JP Yokohama-shi JP Kyoto
- Assignee: Advanced LCD Technologies Development Center Co., Ltd.,Shimadzu Corporation
- Current Assignee: Advanced LCD Technologies Development Center Co., Ltd.,Shimadzu Corporation
- Current Assignee Address: JP Yokohama-shi JP Kyoto
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-363339 20051216
- Main IPC: B23K26/00
- IPC: B23K26/00 ; B23K26/08 ; H01L21/268

Abstract:
A laser crystallization apparatus and a crystallization method with a high throughput are provided. Laser light having a predetermined light intensity distribution is irradiated to a semiconductor film to melt and crystallize, wherein a irradiation position is positioned very quickly and with a high positional accuracy, thereby forming the semiconductor film having a large crystal grain size. A laser crystallization apparatus according to one aspect of the present invention comprises a laser light source, a phase shifter modulating laser light to give a predetermined light intensity distribution, marks provided on the substrate, a substrate holding stage moving in a predetermined direction, mark measuring means measuring a time at which the mark passes a predetermined position, and signal generating means generating a trigger signal indicating the irradiation of the laser light based on the measured time.
Public/Granted literature
- US20070138146A1 LASER CRYSTALLIZATION APPARATUS AND CRYSTALLIZATION METHOD Public/Granted day:2007-06-21
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