Invention Grant
- Patent Title: Apparatus and method for reducing particulate contamination in gas cluster ion beam processing equipment
- Patent Title (中): 气体离子束加工设备中减少颗粒污染的装置和方法
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Application No.: US11775494Application Date: 2007-07-10
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Publication No.: US07642531B2Publication Date: 2010-01-05
- Inventor: Matthew C. Gwinn , Martin D. Tabat
- Applicant: Matthew C. Gwinn , Martin D. Tabat
- Applicant Address: US MA Billerica
- Assignee: TEL Epion Inc.
- Current Assignee: TEL Epion Inc.
- Current Assignee Address: US MA Billerica
- Agency: Wood, Herron & Evans LLP
- Main IPC: H01J37/09
- IPC: H01J37/09 ; H01J37/317
Abstract:
Beam-defining apparatus and methods for defining a gas cluster ion beam used to process a workpiece. The beam-defining apparatus includes a second member projecting from a first member in a direction away from the workpiece and an aperture defined in the first and second members that is configured to transmit at least a portion of the gas cluster ion beam to the workpiece.
Public/Granted literature
- US20080048132A1 APPARATUS AND METHOD FOR REDUCING PARTICULATE CONTAMINATION IN GAS CLUSTER ION BEAM PROCESSING EQUIPMENT Public/Granted day:2008-02-28
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