Invention Grant
- Patent Title: Functional device and method of manufacturing it
- Patent Title (中): 功能装置及其制造方法
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Application No.: US11538323Application Date: 2006-10-03
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Publication No.: US07642541B2Publication Date: 2010-01-05
- Inventor: Eriko Matsui , William Ford , Jurina Wessels , Akio Yasuda , Ryuichiro Maruyama , Tsuyonobu Hatazawa
- Applicant: Eriko Matsui , William Ford , Jurina Wessels , Akio Yasuda , Ryuichiro Maruyama , Tsuyonobu Hatazawa
- Applicant Address: JP Tokyo DE Berlin
- Assignee: Sony Corporation,Sony Deutschland GmbH
- Current Assignee: Sony Corporation,Sony Deutschland GmbH
- Current Assignee Address: JP Tokyo DE Berlin
- Agency: K&L Gates LLP
- Priority: JPP2005-290823 20051004
- Main IPC: H01L49/00
- IPC: H01L49/00

Abstract:
A functional device which is composed of a nanometer-sized functional structure, which can reduce connection resistance in connecting the functional structure to an external electrode, and which includes a wiring section capable of minimizing constraints given to structural designs of various functional structures, and a method of manufacturing it are provided. A functional device in which a functional structure having contained sections in positions spaced from each other is retained by a carbon nanotube. A gap is formed in the carbon nanotube, and the carbon nanotube is segmented into a first carbon nanotube and a second carbon nanotube by the gap. One of the contained sections is contained in the first carbon nanotube at an opening of the first carbon nanotube facing the gap, and the other of the contained sections is contained in the second carbon nanotube at an opening of the second carbon nanotube facing the gap.
Public/Granted literature
- US20070200175A1 FUNCTIONAL DEVICE AND METHOD OF MANUFACTURING IT Public/Granted day:2007-08-30
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