Invention Grant
- Patent Title: Radiation-emitting semiconductor component based on gallium nitride, and method for fabricating the semiconductor component
- Patent Title (中): 基于氮化镓的辐射发射半导体部件及其制造方法
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Application No.: US10439084Application Date: 2003-05-15
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Publication No.: US07642565B2Publication Date: 2010-01-05
- Inventor: Stefan Bader , Berthold Hahn , Volker Härle , Hans-Jürgen Lugauer
- Applicant: Stefan Bader , Berthold Hahn , Volker Härle , Hans-Jürgen Lugauer
- Applicant Address: DE Munich
- Assignee: Osram GmbH
- Current Assignee: Osram GmbH
- Current Assignee Address: DE Munich
- Agency: Cohen Pontani Lieberman & Pavane LLP
- Priority: DE10056475 20001115
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A radiation-emitting semiconductor component has a high p-type conductivity. The semiconductor body of the component includes a substrate, preferably an SiC-based substrate, on which a plurality of GaN-based layers have been formed. The active region of these layers is arranged between at least one n-conducting layer and a p-conducting layer. The p-conducting layer is grown in tensile-stressed form. The p-doping that is used is preferably Mg.
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