Invention Grant
- Patent Title: Insulated gate field effect transistor
- Patent Title (中): 绝缘栅场效应晶体管
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Application No.: US10578286Application Date: 2004-11-03
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Publication No.: US07642596B2Publication Date: 2010-01-05
- Inventor: Steven T. Peake
- Applicant: Steven T. Peake
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Priority: GB0326030.4 20031106
- International Application: PCT/IB2004/052284 WO 20041103
- International Announcement: WO2005/045937 WO 20050519
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/41 ; H01L29/739

Abstract:
An insulated gate field effect transistor has a drain region (2,4), a body region (6) of opposite conductivity type and a source region (8) and an insulated gate (14) extending laterally over the body region (6), defining a channel region (30) extending in the body region (6) from a source end adjacent to the source region (8) to a drain end adjacent to a drain end part (26) of the drain region (4). A conductive shield plate (22) is provided adjacent to the drain end for shielding the gate. Embodiments include a shield plate extension (32) extending over the drain region from the shield plate (22) towards the gate (14).
Public/Granted literature
- US20070080379A1 Insulated gate field effect transistor Public/Granted day:2007-04-12
Information query
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