Invention Grant
- Patent Title: Semiconductor device with a noise prevention structure
- Patent Title (中): 具有防噪声结构的半导体器件
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Application No.: US12275112Application Date: 2008-11-20
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Publication No.: US07642615B2Publication Date: 2010-01-05
- Inventor: Sheng-Yow Chen , Dichi Tsai
- Applicant: Sheng-Yow Chen , Dichi Tsai
- Applicant Address: TW Hsinchu
- Assignee: Airoha Technology Corp.
- Current Assignee: Airoha Technology Corp.
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Priority: TW93125487A 20040826
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
A semiconductor device including a substrate of a first semiconductor type with a pad region and a noise prevention structure in the substrate, on least one side of the pad region. The device further includes the substrate structure, a pad, and a dielectric layer therebetween.
Public/Granted literature
- US20090102011A1 SEMICONDUCTOR DEVICE WITH A NOISE PREVENTION STRUCTURE Public/Granted day:2009-04-23
Information query
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