Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US11050698Application Date: 2005-02-07
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Publication No.: US07642646B2Publication Date: 2010-01-05
- Inventor: Yoshifumi Nakamura , Takayuki Tanaka
- Applicant: Yoshifumi Nakamura , Takayuki Tanaka
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Steptoe & Johnson LLP
- Priority: JP2004-032771 20040210; JP2005-000305 20050105
- Main IPC: H01L23/489
- IPC: H01L23/489

Abstract:
A semiconductor device is configured such that an electrode pad connected to an internal circuit is formed on a surface of a semiconductor substrate, wires are formed near and around the electrode pad, a protective film is formed which covers the edge of the electrode pad, the wires, and the surface of the semiconductor substrate, and a metal bump is formed on the electrode pad such that the edge of the electrode is disposed on the protective film on the wires. According to this configuration, since the wires are formed near the electrode pad, the protective film covering the edge of the electrode pad and an area around the edge is formed relatively flat, and the metal bump has a flat surface on a convex portion formed on the relatively flat protective film. Therefore, even when the electrode pad is small, a flat area can be sufficiently obtained on the surface of the metal bump, thereby obtaining stable connection via an anisotropic conductive sheet or the like by COG.
Public/Granted literature
- US20050173798A1 Semiconductor device and method of manufacturing the same Public/Granted day:2005-08-11
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