Invention Grant
- Patent Title: Alignment apparatus and alignment method
- Patent Title (中): 对准装置和对准方法
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Application No.: US11855644Application Date: 2007-09-14
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Publication No.: US07643144B2Publication Date: 2010-01-05
- Inventor: Takuma Okamuro , Motonori Okumura , Mutsuhiko Ota , Kazutoshi Goto , Isao Yanagisawa , Yasuo Inaoka
- Applicant: Takuma Okamuro , Motonori Okumura , Mutsuhiko Ota , Kazutoshi Goto , Isao Yanagisawa , Yasuo Inaoka
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-248840 20060914
- Main IPC: G01B11/00
- IPC: G01B11/00 ; B41J29/393
Abstract:
An adjusting unit for making positional adjustment of the optical axis adjustment mask, based on the observation by the one optical unit, such that the reference mark at the one location or the other location and the optical axis adjusting alignment mark corresponding positionally thereto are superposed, and for making optical axis adjustment of the other optical axis, based on the observation by the other optical unit, such that the reference mark at the one location or the other location and the optical axis adjusting alignment mark corresponding positionally thereto are superposed.
Public/Granted literature
- US20080068610A1 ALIGNMENT APPARATUS AND ALIGNMENT METHOD Public/Granted day:2008-03-20
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