Invention Grant
- Patent Title: Method of aligning an optical system
- Patent Title (中): 对准光学系统的方法
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Application No.: US11920838Application Date: 2006-05-23
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Publication No.: US07643149B2Publication Date: 2010-01-05
- Inventor: Rolf Freimann , Ulrich Wagemann
- Applicant: Rolf Freimann , Ulrich Wagemann
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Townsend and Townsend and Crew LLP
- International Application: PCT/EP2006/004900 WO 20060523
- International Announcement: WO2006/125609 WO 20061130
- Main IPC: G01B9/021
- IPC: G01B9/021 ; G01B11/02

Abstract:
A method of manufacturing an optical system having plural optical elements mounted relative to each other on a mounting structure of the optical system comprises disposing the optical system in a beam path of an interferometer apparatus having an interferometer optics and a selectable hologram for shaping a beam of measuring light to be incident on surfaces of the optical elements of the optical system; selecting a first hologram of the interferometer apparatus and recording at least one first interference pattern generated by measuring light reflected from a surface of a first optical element; selecting a second hologram of the interferometer apparatus, wherein the second hologram is different from the first hologram, and recording at least one second interference pattern generated by measuring light reflected from a surface of a second optical element, which is different from the first optical element; and adjusting a position of the first optical element relative to the second optical element on the mounting structure based upon the first interference pattern and the second interference pattern.
Public/Granted literature
- US20090231593A1 Method of aligning an optical system Public/Granted day:2009-09-17
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