Invention Grant
- Patent Title: Optical apparatus, exposure apparatus, and device manufacturing method
- Patent Title (中): 光学装置,曝光装置和装置制造方法
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Application No.: US11835022Application Date: 2007-08-07
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Publication No.: US07643150B2Publication Date: 2010-01-05
- Inventor: Ryo Nawata
- Applicant: Ryo Nawata
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2006-220637 20060811
- Main IPC: G01B9/02
- IPC: G01B9/02

Abstract:
An optical apparatus includes a first element, a second element, a support which supports the first element, a first measuring device which measures the position of the first element relative to the support, a second measuring device which measures the position of the second element relative to the support, a third measuring device which measures any deformation of the support, and a controller. The controller controls the relative position between the first element and the second element on the basis of the measurement results obtained by the first measuring device, the second measuring device, and the third measuring device.
Public/Granted literature
- US20080037029A1 OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2008-02-14
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