Invention Grant
US07643192B2 Pattern generator using a dual phase step element and method of using same
有权
使用双相步进元件的图案发生器及其使用方法
- Patent Title: Pattern generator using a dual phase step element and method of using same
- Patent Title (中): 使用双相步进元件的图案发生器及其使用方法
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Application No.: US10995092Application Date: 2004-11-24
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Publication No.: US07643192B2Publication Date: 2010-01-05
- Inventor: Nabila Baba-Ali
- Applicant: Nabila Baba-Ali
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G02B26/08
- IPC: G02B26/08

Abstract:
A system and method are used to pattern light using an illumination system, an array of individually controllable components, and a projection system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The array of individually controllable elements comprises mirrors having first and second steps on opposite edges. The projection system projects the patterned beam onto a target portion of an object. In various examples, the object can be a display, a semiconductor substrate or wafer, a flat panel display glass substrate, or the like, as is discussed in more detail below.
Public/Granted literature
- US20060109576A1 Pattern generator using a dual phase step element and method of using same Public/Granted day:2006-05-25
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