Invention Grant
- Patent Title: Maximal-aperture reflecting objective
- Patent Title (中): 最大光圈反射目标
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Application No.: US11542634Application Date: 2006-10-02
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Publication No.: US07643226B2Publication Date: 2010-01-05
- Inventor: Dejan Vucinic , Thomas M. Bartol , Terrence J. Sejnowski
- Applicant: Dejan Vucinic , Thomas M. Bartol , Terrence J. Sejnowski
- Applicant Address: US CA La Jolla
- Assignee: Salk Institute for Biological Studies
- Current Assignee: Salk Institute for Biological Studies
- Current Assignee Address: US CA La Jolla
- Agency: Klarquist Sparkman, LLP
- Main IPC: G02B17/00
- IPC: G02B17/00

Abstract:
Objectives and other optical assemblies include a reflective surface that is truncated at or near a focus based on a curvature of the reflective surface. A specimen is situated at or near the focus of the reflective surface, so that the reflective surface captures and collimates optical radiation emitted from the specimen. The reflective surface can be defined on an optical substrate along with a lens surface, so that an illumination flux is focused on the specimen by the lens surface, and a secondary light flux produced in response to the illumination flux is captured and collimated by the reflective surface.
Public/Granted literature
- US20070153368A1 Maximal-aperture reflecting objective Public/Granted day:2007-07-05
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |