Invention Grant
- Patent Title: Immersion lithography laser light source with pulse stretcher
- Patent Title (中): 浸没光刻激光光源带脉冲担架
-
Application No.: US11973671Application Date: 2007-10-10
-
Publication No.: US07643528B2Publication Date: 2010-01-05
- Inventor: William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J. W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Michael Wyatt , Walter Crosby
- Applicant: William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J. W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Michael Wyatt , Walter Crosby
- Applicant Address: US CA San Diego
- Assignee: Cymer, Inc.
- Current Assignee: Cymer, Inc.
- Current Assignee Address: US CA San Diego
- Main IPC: H01S3/22
- IPC: H01S3/22

Abstract:
An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
Public/Granted literature
- US20090080476A1 Immersion lithography laser light source with pulse stretcher Public/Granted day:2009-03-26
Information query