Invention Grant
- Patent Title: Method and apparatus for angular-resolved spectroscopic lithography characterization
- Patent Title (中): 用于角分辨光谱光刻特征的方法和装置
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Application No.: US11500496Application Date: 2006-08-08
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Publication No.: US07643666B2Publication Date: 2010-01-05
- Inventor: Irwan Dani Setija , Arie Jeffrey Den Boef
- Applicant: Irwan Dani Setija , Arie Jeffrey Den Boef
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G01B11/02

Abstract:
Reconstruction of an object by which radiation is diffracted is disclosed. Specifically, the reconstruction includes: estimating the object shape; deriving a model diffraction pattern from the estimated shape; illuminating the object with radiation; detecting a diffraction pattern of radiation diffracted by the object; comparing the model diffraction pattern and the detected diffraction pattern; and determining the actual object shape from the difference between the model diffraction pattern and the detected diffraction pattern, wherein the model diffraction pattern is determined using Bloch Mode Expansion.
Public/Granted literature
- US20080069430A1 Method and apparatus for angular-resolved spectroscopic lithography characterization Public/Granted day:2008-03-20
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