Disclosed is a method and a system for identifying lens aberration sensitive patterns in an integrated circuit chip. A first simulation of a layout is performed to simulate a contour without lens aberration. A second simulation is performed of the layout to simulate a contour with lens aberration. A difference of critical dimension is determined between the contours with and without lens aberration, and at least one lens aberration sensitive pattern is selected from a plurality of layouts based on the difference in critical dimension.