Invention Grant
- Patent Title: Flux spray atomization and splash control
- Patent Title (中): 通量喷雾雾化和飞溅控制
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Application No.: US11648119Application Date: 2006-12-29
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Publication No.: US07644871B2Publication Date: 2010-01-12
- Inventor: Harikrishnan Ramanan , Sabina Houle , Nitin Deshpande , Michael Colella , Nagaratnam Murugaiah
- Applicant: Harikrishnan Ramanan , Sabina Houle , Nitin Deshpande , Michael Colella , Nagaratnam Murugaiah
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Caven & Aghevli LLC
- Main IPC: A62C5/02
- IPC: A62C5/02

Abstract:
Methods and apparatus to improve flux spray atomization and/or splash control are described. In one embodiment, a flux nozzle includes a plurality of injection holes to deposit flux fluid through an exit hole of an air cap onto a substrate (such as a printed circuit board). The flux fluid may atomize prior to deposition onto the substrate as relatively smaller broken down flux droplets that may aid reduced spray splash. Other embodiments are also described.
Public/Granted literature
- US20080156851A1 Flux spray atomization and splash control Public/Granted day:2008-07-03
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