Invention Grant
- Patent Title: Systems and methods for creating crystallographic-orientation controlled poly-silicon films
- Patent Title (中): 用于制造晶体取向控制的多晶硅膜的系统和方法
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Application No.: US10994205Application Date: 2004-11-18
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Publication No.: US07645337B2Publication Date: 2010-01-12
- Inventor: James S. Im , Paul Christian van der Wilt
- Applicant: James S. Im , Paul Christian van der Wilt
- Applicant Address: US NY New York
- Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee Address: US NY New York
- Agency: Wilmer Cutler Pickering Hale and Dorr LLP
- Main IPC: C30B13/00
- IPC: C30B13/00 ; H01L21/20

Abstract:
In accordance with one aspect, the present invention provides a method for providing polycrystalline films having a controlled microstructure as well as a crystallographic texture. The methods provide elongated grains or single-crystal islands of a specified crystallographic orientation. In particular, a method of processing a film on a substrate includes generating a textured film having crystal grains oriented predominantly in one preferred crystallographic orientation; and then generating a microstructure using sequential lateral solidification crystallization that provides a location-controlled growth of the grains orientated in the preferred crystallographic orientation.
Public/Granted literature
- US20060102901A1 Systems and methods for creating crystallographic-orientation controlled poly-Silicon films Public/Granted day:2006-05-18
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