Invention Grant
US07645342B2 Restricted radiated heating assembly for high temperature processing 有权
限制辐射加热组件进行高温处理

Restricted radiated heating assembly for high temperature processing
Abstract:
A vapor deposition reactor and associated method are disclosed that increase the lifetime and productivity of a filament-based resistive-heated vapor deposition system. The reactor and method provide for heating the filament while permitting the filament to move as it expands under the effect of increasing temperature while limiting the expanding movement of the filament to an amount that prevents the expanding movement of the filament from creating undesired contact with any portions of the reactor.
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