Invention Grant
- Patent Title: Restricted radiated heating assembly for high temperature processing
- Patent Title (中): 限制辐射加热组件进行高温处理
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Application No.: US11272909Application Date: 2005-11-14
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Publication No.: US07645342B2Publication Date: 2010-01-12
- Inventor: David Todd Emerson , Robert Allen Garner , Michael John Bergmann , Keenan Carlyle Brown , Michael Allen Pennington , Thomas Goldthwaite Coleman
- Applicant: David Todd Emerson , Robert Allen Garner , Michael John Bergmann , Keenan Carlyle Brown , Michael Allen Pennington , Thomas Goldthwaite Coleman
- Applicant Address: US NC Durham
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US NC Durham
- Agency: Summa, Additon & Ashe, P.A.
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306

Abstract:
A vapor deposition reactor and associated method are disclosed that increase the lifetime and productivity of a filament-based resistive-heated vapor deposition system. The reactor and method provide for heating the filament while permitting the filament to move as it expands under the effect of increasing temperature while limiting the expanding movement of the filament to an amount that prevents the expanding movement of the filament from creating undesired contact with any portions of the reactor.
Public/Granted literature
- US20060130763A1 Restricted radiated heating assembly for high temperature processing Public/Granted day:2006-06-22
Information query
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