Invention Grant
- Patent Title: Flow rate control
- Patent Title (中): 流量控制
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Application No.: US10557924Application Date: 2004-05-19
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Publication No.: US07645388B2Publication Date: 2010-01-12
- Inventor: David W. Neyer , David J. Rakestraw , Jason E. Rehm
- Applicant: David W. Neyer , David J. Rakestraw , Jason E. Rehm
- Applicant Address: US CA Dublin
- Assignee: Eksigent Technologies, LLC
- Current Assignee: Eksigent Technologies, LLC
- Current Assignee Address: US CA Dublin
- Agency: Sheldon Mak Rose & Anderson PC
- Agent Jeffrey G. Sheldon
- International Application: PCT/US2004/015838 WO 20040519
- International Announcement: WO2004/112960 WO 20041229
- Main IPC: B01D15/08
- IPC: B01D15/08

Abstract:
A liquid sample is prepared at a preparation site and then processed, e.g. in an HPLC column. The sample is prepared and conveyed to the device at a flow rate which is substantially less than the flow rate through the device. The different flow rates are preferably provided by variable rate working fluid supplies which drive the sample from the preparation site and through the device.
Public/Granted literature
- US20070037293A1 Flow rate control Public/Granted day:2007-02-15
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