Invention Grant
- Patent Title: Photoreceptor overcoat layer masking agent
- Patent Title (中): 光敏剂外涂层掩蔽剂
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Application No.: US11556815Application Date: 2006-11-06
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Publication No.: US07645548B2Publication Date: 2010-01-12
- Inventor: Kathy L. De Jong , Hany Aziz , Nan-Xing Hu
- Applicant: Kathy L. De Jong , Hany Aziz , Nan-Xing Hu
- Applicant Address: US CT Norwalk
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: US CT Norwalk
- Agency: Oliff & Berridge, PLC
- Main IPC: G03G5/06
- IPC: G03G5/06

Abstract:
A coating composition having a polymer resin composition containing at lest an acid catalyst and a masking agent, wherein the masking agent is selected from the group consisting of compound A, compound B, and the acylated derivatives of compound A, where compound A is given by the structural formula (I): where X represents a substituent selected from the group consisting of —OR and —NR′R″, wherein R, R′, and R″ each independently represent a hydrogen atom or a hydrocarbyl group; and compound B is given by the structural formula (II): where Y and Z independently represent —OH or —NH2.
Public/Granted literature
- US20080107980A1 PHOTORECEPTOR OVERCOAT LAYER MASKING AGENT Public/Granted day:2008-05-08
Information query
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