Invention Grant
- Patent Title: Photosensitive film
- Patent Title (中): 感光膜
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Application No.: US09508771Application Date: 1998-09-17
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Publication No.: US07645561B1Publication Date: 2010-01-12
- Inventor: Jinko Kimura , Chikara Ishikawa , Youji Tanaka , Shinji Takano , Yoshitaka Minami
- Applicant: Jinko Kimura , Chikara Ishikawa , Youji Tanaka , Shinji Takano , Yoshitaka Minami
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JP Tokyo
- Priority: JP09-254816 19970919
- International Application: PCT/JP98/04184 WO 19980917
- International Announcement: WO99/15936 WO 19990401
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004

Abstract:
A photosensitive film excellent in workability and making it possible, in a normal pressure laminating process, to laminate photosensitive films on the surface of substrate having a metallic surface with a reduced number of air voids generated and in a high product yield, said film comprising a support film (A), a photosensitive resin composition-containing photosensitive resin layer (B) formed on said support (A) and a protecting film (C) further stuck on said layer (B), wherein the number of fish eyes having a diameter of at least 80 μm included in the protecting film (C) does not exceed 5 fish eyes/m2.
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