Invention Grant
- Patent Title: Photosensitive resin composition, photosensitive layer using the same and photosensitive resin printing original plate
- Patent Title (中): 感光树脂组合物,使用感光层和感光树脂印刷原版
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Application No.: US10552596Application Date: 2004-04-07
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Publication No.: US07645563B2Publication Date: 2010-01-12
- Inventor: Toru Wada , Tomonori Hiramatsu , Akira Tomita
- Applicant: Toru Wada , Tomonori Hiramatsu , Akira Tomita
- Applicant Address: JP Osaka
- Assignee: Toyo Boseki Kabushiki Kaisha
- Current Assignee: Toyo Boseki Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: JP2003-103021 20030407; JP2004-103509 20040331
- International Application: PCT/JP2004/004981 WO 20040407
- International Announcement: WO2004/090638 WO 20041021
- Main IPC: G03F7/033
- IPC: G03F7/033

Abstract:
The present invention is to obtain without any trouble a photosensitive resin composition, a photosensitive layer and a photosensitive resin printing original plate, which are developable with an aqueous developer, resistant to an aqueous ink and a cosolvent ink, and assured of good image reproducibility. The present invention relates to a photosensitive resin composition comprising (A) hydrophobic polymers obtained from at least two or more water dispersion latexes, (B) a photopolymerizable compound and (C) a photopolymerization initiator, wherein the two or more hydrophobic polymers each is present in a fine particle state.
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