Invention Grant
US07645625B2 Method for fine processing of substrate, method for fabrication of substrate, and light emitting device 有权
基板的精细加工方法,基板的制造方法以及发光装置

Method for fine processing of substrate, method for fabrication of substrate, and light emitting device
Abstract:
The present invention provides a method for fine processing of a substrate, a method for fabrication of a substrate, and a light emitting device. In the method for fine processing of a substrate, after removing a single particle layer from the substrate having the single particle layer, a hole having an inner diameter smaller than a diameter of a particle and centering on a position on the substrate where each particle constructing the single particle layer has been placed is formed by etching.
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