Invention Grant
- Patent Title: Thin film transistor and method of fabricating the same
- Patent Title (中): 薄膜晶体管及其制造方法
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Application No.: US11397746Application Date: 2006-04-04
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Publication No.: US07645647B2Publication Date: 2010-01-12
- Inventor: Gee-Sung Chae , Mi-Kyung Park
- Applicant: Gee-Sung Chae , Mi-Kyung Park
- Applicant Address: KR Seoul
- Assignee: LG. Display Co., Ltd.
- Current Assignee: LG. Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Brinks Hofer Gilson & Lione
- Priority: KR10-2005-0029121 20050407
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A thin film transistor includes a multi-coaxial silicon nanowire unit including a plurality of coaxial silicon nanowires on a substrate, the multi-coaxial silicon nanowire unit including a central portion and end portions of the central portion; a gate electrode on the central portion; and a source electrode and a drain electrode on the respective end portions, respectively, so as to electrically connect to the multi-coaxial silicon nanowire unit.
Public/Granted literature
- US20060226425A1 Thin film transistor and method of fabricating the same Public/Granted day:2006-10-12
Information query
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