Invention Grant
- Patent Title: Focusing apparatus and lithography system using the same
- Patent Title (中): 聚焦设备和使用它的光刻系统
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Application No.: US11311282Application Date: 2005-12-20
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Publication No.: US07646003B2Publication Date: 2010-01-12
- Inventor: Chang-Wook Moon , Dong-Soo Kim , Myung-Gon Song , Seung-Woon Lee , Yun-Sang Oh
- Applicant: Chang-Wook Moon , Dong-Soo Kim , Myung-Gon Song , Seung-Woon Lee , Yun-Sang Oh
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2004-0109269 20041221
- Main IPC: H01J37/22
- IPC: H01J37/22
Abstract:
A focusing apparatus and a lithography system using the same capable of adjusting a uniformity of an electromagnetic field by moving a portion of a magnetic field generator. The focusing apparatus may control a path of an electron beam generated from an electron-beam emitter of the lithography system. In the focusing apparatus, a uniformity of the magnetic field in the vacuum chamber may be adjusted through movement of the portion of the magnetic field generator with respect to the vacuum chamber.
Public/Granted literature
- US20060151712A1 Focusing apparatus and lithography system using the same Public/Granted day:2006-07-13
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