Invention Grant
US07646142B2 Field emission device (FED) having cathode aperture to improve electron beam focus and its method of manufacture
失效
具有阴极孔径以改善电子束聚焦的场发射器件(FED)及其制造方法
- Patent Title: Field emission device (FED) having cathode aperture to improve electron beam focus and its method of manufacture
- Patent Title (中): 具有阴极孔径以改善电子束聚焦的场发射器件(FED)及其制造方法
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Application No.: US11223031Application Date: 2005-09-12
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Publication No.: US07646142B2Publication Date: 2010-01-12
- Inventor: Ho-Suk Kang , Jun-Hee Choi , Byong-Gwon Song , Ha-Jong Kim
- Applicant: Ho-Suk Kang , Jun-Hee Choi , Byong-Gwon Song , Ha-Jong Kim
- Applicant Address: KR Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: Samsung SDI Co., Ltd.
- Current Assignee: Samsung SDI Co., Ltd.
- Current Assignee Address: KR Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2004-0073365 20040914
- Main IPC: H01J19/06
- IPC: H01J19/06 ; H01J1/14 ; H01K1/04 ; H01J1/62

Abstract:
A Field Emission Device (FED) and its method of manufacture includes: forming a substrate; forming a cathode having a cathode aperture on an upper surface of the substrate; forming a material layer having a first through hole with a smaller diameter than that of the cathode aperture on an upper surface of the cathode; forming a first insulator having a first cavity on an upper surface of the material layer; forming a gate electrode having a second through hole on an upper surface of the first insulator; and forming an emitter in a central portion of the cathode aperture.
Public/Granted literature
- US20060055304A1 Field emission device (FED) and its method of manufacture Public/Granted day:2006-03-16
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