Invention Grant
- Patent Title: Immersion lithographic process using a variable scan speed
- Patent Title (中): 浸渍光刻工艺采用可变扫描速度
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Application No.: US12013511Application Date: 2008-01-14
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Publication No.: US07646470B2Publication Date: 2010-01-12
- Inventor: Rene Wirtz
- Applicant: Rene Wirtz
- Applicant Address: KY Grand Cayman
- Assignee: GlobalFoundries, Inc.
- Current Assignee: GlobalFoundries, Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Williams, Morgan & Amerson
- Priority: DE102007025340 20070531
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
A lithography system and a lithography method is provided for increasing reliability and efficiency of immersion lithography. By varying a scan speed between a wafer and an optical component depending on at least one process parameter during exposure of the wafer, loosening of a fluid meniscus during the relative movement of the optical component and the wafer is avoided.
Public/Granted literature
- US20080297749A1 IMMERSION LITHOGRAPHIC PROCESS USING A VARIABLE SCAN SPEED Public/Granted day:2008-12-04
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