Invention Grant
US07646471B2 Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby
有权
平版印刷装置，液位传感器，检查方法，装置制造方法以及由此制造的装置
- Patent Title: Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby
- Patent Title (中): 平版印刷装置，液位传感器，检查方法，装置制造方法以及由此制造的装置
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Application No.: US11812165Application Date: 2007-06-15
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Publication No.: US07646471B2Publication Date: 2010-01-12
- Inventor: Paulus Antonius Andreas Teunissen , Petrus Johannes Maria Broodbakker , Rene Marinus Gerardus Johan Queens
- Applicant: Paulus Antonius Andreas Teunissen , Petrus Johannes Maria Broodbakker , Rene Marinus Gerardus Johan Queens
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP03075118 20030114
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/54
Abstract:
A level sensor for a lithographic projection apparatus according to one embodiment of the invention includes a light source, a first reflector, a second reflector and a detector. The first reflector is positioned to direct light from the light source towards a wafer surface, and the second reflector is positioned to direct light reflected from the wafer surface to the detector. The first and second reflectors are selected to incur a minimal process dependent apparent surface depression.
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