Invention Grant
US07646494B2 System and method for detecting the displacement of a plurality of micro- and nanomechanical elements, such as micro-cantilevers
有权
用于检测多个微型和纳米机械元件(例如微悬臂梁)的位移的系统和方法
- Patent Title: System and method for detecting the displacement of a plurality of micro- and nanomechanical elements, such as micro-cantilevers
- Patent Title (中): 用于检测多个微型和纳米机械元件(例如微悬臂梁)的位移的系统和方法
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Application No.: US11962027Application Date: 2007-12-20
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Publication No.: US07646494B2Publication Date: 2010-01-12
- Inventor: Laura M. Lechuga Gomez , Mar Alvarez Sanchez , Francisco Javier Tamayo de Miguel
- Applicant: Laura M. Lechuga Gomez , Mar Alvarez Sanchez , Francisco Javier Tamayo de Miguel
- Applicant Address: ES Madrid
- Assignee: Consejo Superior de Investigaciones Cientificas
- Current Assignee: Consejo Superior de Investigaciones Cientificas
- Current Assignee Address: ES Madrid
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: EP04381004 20040308
- Main IPC: G01B11/14
- IPC: G01B11/14 ; G01J5/02

Abstract:
The invention relates to a system and method for detecting the displacement, such as the deflection, of a plurality of elements (1), such as microcantilevers, forming part of an array (2), by emitting a light beam (4) towards the array (2) and by receiving a reflected light beam on an optical position detector, whereby the position of incidence of the light beam is determined by the displacement of the corresponding element. The system further comprises: scanning means (7) for the displacing the light beam (4) along the array (2) so that the light beam is sequentially reflected, by the individual elements (1) along said array (2); and reflection detecting means (11) for detecting when the light beam is reflected by an element. The system is arranged so that when the reflection detecting means (11) detect that the light beam is reflected by an element, the corresponding position of incidence of the light on the detector is taken as an indication of the displacement of the element.
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