Invention Grant
US07646551B2 Microlenses with patterned holes to produce a desired focus location
有权
具有图案化孔的微透镜以产生期望的聚焦位置
- Patent Title: Microlenses with patterned holes to produce a desired focus location
- Patent Title (中): 具有图案化孔的微透镜以产生期望的聚焦位置
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Application No.: US11987868Application Date: 2007-12-05
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Publication No.: US07646551B2Publication Date: 2010-01-12
- Inventor: Jin Li , Jiutao Li , Ulrich Boettiger
- Applicant: Jin Li , Jiutao Li , Ulrich Boettiger
- Applicant Address: KY Grand Cayman
- Assignee: Aptina Imaging Corporation
- Current Assignee: Aptina Imaging Corporation
- Current Assignee Address: KY Grand Cayman
- Agency: Dickstein Shapiro LLP
- Main IPC: G02B3/00
- IPC: G02B3/00
Abstract:
A method, apparatus and system providing a microlens having a substantially flat upper surface and having a plurality of holes arranged in a pattern in a microlens material which produces a focal point at a desired location.
Public/Granted literature
- US20090147379A1 Microlenses with patterned holes to produce a desired focus location Public/Granted day:2009-06-11
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